International Journal of Materials Engineering and Technology

The International Journal of Materials Engineering and Technology publishes peer-reviewed articles on various materials, their properties, processing, and applications in fields such as electronics, energy, and structural engineering. It also welcomes survey articles on advancements in material engineering.

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ON POSSIBILITY OF DRAIN OF DOPANT IN A MULTILAYER STRUCTURE TO INCREASE HOMOGENEITY OF DISTRIBUTION OF THE DOPANT’S CONCENTRATION

Authors

  • E. L. Pankratov

Keywords:

ion implantation, multilayer structure, changing of distribution of concentration of dopant, model of process, analytical approach for analysis

DOI:

https://doi.org/10.17654/0975044424005

Abstract

In this paper, we introduce an approach to increase homogeneity of distribution of implanted dopant in enriched area due to organization of drains. Also we introduce a model and analytical approach for analysis of the considered technological process in multilayer structures with account variation in time parameters of the process and nonlinearity of mass transport.

Received: May 21, 2024;
Accepted: June 10, 2024

References

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Published

2024-06-28

Issue

Vol. 23 No. 1 (2024)

Section

Articles

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How to Cite

ON POSSIBILITY OF DRAIN OF DOPANT IN A MULTILAYER STRUCTURE TO INCREASE HOMOGENEITY OF DISTRIBUTION OF THE DOPANT’S CONCENTRATION. (2024). International Journal of Materials Engineering and Technology, 23(1), 81-100. https://doi.org/10.17654/0975044424005